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JKCS

Journal of the Korean Chemical Society
Bimonthly Online Journal (eISSN: 2234-8530)

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Search : "[ keyword: Photoresist ]" (1)
A Novel Photoresist based on Polymeric Acid Amplifier
Eun Ju Lee  Yong Seok Jeong  Kwon Taek Lim  Yeon Tae Jeong
Vol. 48, No. 1, pp. 39-0, Feb. 2004
10.5012/jkcs.2004.48.1.039
    포토레지스트 고분자형 산 증식제 열적 안정성 광감도 Photoresist Polymeric Acid Amplifier Thermal stability Photosensitivity

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    Synthesis DFT Antimicrobial activity Adsorption Corrosion Crystal structure Critical micelle concentration Schiff base Density functional theory

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ISSN(Print) 1017-2548
ISSN(Online) 2234-8530



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